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Automatic mask adaptation of cmos-compatible micromachined devices using their finite element model

Lang, Markus and Glesner, (1997):
Automatic mask adaptation of cmos-compatible micromachined devices using their finite element model.
In: MME' 97: Micromechanics Europe <1997, Southampton>; Proceedings. S. 215-218, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 1997
Creators: Lang, Markus and Glesner,
Title: Automatic mask adaptation of cmos-compatible micromachined devices using their finite element model
Language: English
Series Name: MME' 97: Micromechanics Europe <1997, Southampton>; Proceedings. S. 215-218
Divisions: 18 Department of Electrical Engineering and Information Technology
Date Deposited: 19 Nov 2008 16:04
License: [undefiniert]
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