Krauss, Tillmann and Wessely, Frank and Schwalke, Udo (2016):
Favorable Combination of Schottky Barrier and Junctionless Properties in Field-Effect Transistors for High Temperature Applications.
In: ECS Transactions, pp. 57-63, 75, (13), [Article]
| Item Type: | Article |
|---|---|
| Erschienen: | 2016 |
| Creators: | Krauss, Tillmann and Wessely, Frank and Schwalke, Udo |
| Title: | Favorable Combination of Schottky Barrier and Junctionless Properties in Field-Effect Transistors for High Temperature Applications |
| Language: | English |
| Journal or Publication Title: | ECS Transactions |
| Volume: | 75 |
| Number: | 13 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 24 Oct 2016 08:14 |
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