Krauss, Tillmann and Wessely, Frank and Schwalke, Udo (2016):
Favorable Combination of Schottky Barrier and Junctionless Properties in Field-Effect Transistors for High Temperature Applications.
In: ECS Transactions, 75 (13), pp. 57-63. [Article]
Item Type: | Article |
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Erschienen: | 2016 |
Creators: | Krauss, Tillmann and Wessely, Frank and Schwalke, Udo |
Title: | Favorable Combination of Schottky Barrier and Junctionless Properties in Field-Effect Transistors for High Temperature Applications |
Language: | English |
Journal or Publication Title: | ECS Transactions |
Journal volume: | 75 |
Number: | 13 |
Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
Date Deposited: | 24 Oct 2016 08:14 |
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