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Temperature-depending Raman line-shift of silicon carbide

Bauer, M. and Gigler, A. M. and Huber, A. J. and Hillenbrand, R. and Stark, R. W. (2009):
Temperature-depending Raman line-shift of silicon carbide.
40, In: Journal of Raman Spectroscopy, (12), pp. 1867-1874, ISSN 0377-0486, [Online-Edition: http://dx.doi.org/10.1002/jrs.2334],
[Article]

Item Type: Article
Erschienen: 2009
Creators: Bauer, M. and Gigler, A. M. and Huber, A. J. and Hillenbrand, R. and Stark, R. W.
Title: Temperature-depending Raman line-shift of silicon carbide
Language: German
Journal or Publication Title: Journal of Raman Spectroscopy
Volume: 40
Number: 12
Divisions: DFG-Collaborative Research Centres (incl. Transregio)
DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres
Date Deposited: 20 Jul 2016 12:30
Official URL: http://dx.doi.org/10.1002/jrs.2334
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