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Nano-laminating of SiO2 and TiO2: Atomic layer deposition as a tool to gain new insight into interfaces

Sobel, Nicolas and Hess, Christian (2015):
Nano-laminating of SiO2 and TiO2: Atomic layer deposition as a tool to gain new insight into interfaces.
In: MRS Proceedings, pp. mrs15-2118320, 1805, ISSN 1946-4274, [Online-Edition: http://dx.doi.org/10.1557/opl.2015.554],
[Article]

Item Type: Article
Erschienen: 2015
Creators: Sobel, Nicolas and Hess, Christian
Title: Nano-laminating of SiO2 and TiO2: Atomic layer deposition as a tool to gain new insight into interfaces
Language: English
Journal or Publication Title: MRS Proceedings
Volume: 1805
Divisions: 07 Department of Chemistry > Physical Chemistry
07 Department of Chemistry
Date Deposited: 08 Jun 2015 06:48
Official URL: http://dx.doi.org/10.1557/opl.2015.554
Identification Number: doi:10.1557/opl.2015.554
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