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Semiconductor to metal transition of WS2 induced by K intercalation in ultrahigh vacuum

Ohuchi, F. S. and Jaegermann, W. and Pettenkofer, C. and Parkinson, B. A. (1989):
Semiconductor to metal transition of WS2 induced by K intercalation in ultrahigh vacuum.
5, In: Langmuir, (2), pp. 439-442, ISSN 0743-7463, [Online-Edition: http://dx.doi.org/10.1021/la00086a026],
[Article]

Item Type: Article
Erschienen: 1989
Creators: Ohuchi, F. S. and Jaegermann, W. and Pettenkofer, C. and Parkinson, B. A.
Title: Semiconductor to metal transition of WS2 induced by K intercalation in ultrahigh vacuum
Language: English
Journal or Publication Title: Langmuir
Volume: 5
Number: 2
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Date Deposited: 24 Apr 2015 09:50
Official URL: http://dx.doi.org/10.1021/la00086a026
Identification Number: doi:10.1021/la00086a026
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