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Thin Film Intercalation Compounds: UHV Deposition and Changes of Electronic Structure

Jaegermann, W. and Tonti, D. and Thißen, A. and Ensling, D. and Wu, Q.-H. and Fernandez-Madrigal, F. and Pettenkofer, C. Zaghib, K. and Julien, C. M. and Prakash, J. (eds.) (2003):
Thin Film Intercalation Compounds: UHV Deposition and Changes of Electronic Structure.
In: Proceeding Electrochemical Society, In: New Trends in Intercalation Compounds for Energy Storage and Conversion: Proceedings of the International Symposium, pp. 561-574, [Book Section]

Item Type: Book Section
Erschienen: 2003
Editors: Zaghib, K. and Julien, C. M. and Prakash, J.
Creators: Jaegermann, W. and Tonti, D. and Thißen, A. and Ensling, D. and Wu, Q.-H. and Fernandez-Madrigal, F. and Pettenkofer, C.
Title: Thin Film Intercalation Compounds: UHV Deposition and Changes of Electronic Structure
Language: English
Title of Book: New Trends in Intercalation Compounds for Energy Storage and Conversion: Proceedings of the International Symposium
Series Name: Proceeding Electrochemical Society
ISBN: 1-56677-403-9
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Date Deposited: 11 Mar 2015 23:46
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