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Superior electronic passivation of n-GaP(100) surface using alcoholic as compared to aqueous ammonium sulfide solution: Wet processing studied with synchrotron photoelectron spectroscopy

Lebedev, Mikhail V. ; Mayer, Thomas (2014)
Superior electronic passivation of n-GaP(100) surface using alcoholic as compared to aqueous ammonium sulfide solution: Wet processing studied with synchrotron photoelectron spectroscopy.
In: physica status solidi (a), 211 (9)
doi: 10.1002/pssa.201330402
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

The chemical composition and the electronic properties of the n-GaP(100) surface treated with ammonium sulfide dissolved in water versus 2-propanol is investigated using synchrotron-radiation photoemission spectroscopy (SXPS). Chemical composition and electronic structure of the passivated surfaces vary in dependence of the solvent used. The valence band maximum and the core level binding energies of the sulfide layers measured in the most surface sensitive mode are found at 1.0 and 0.75–0.9 eV higher binding energies using 2-propanol versus aqueous solution. This flattening of bands actually is related to photovoltage induced by synchrotron radiation. The strong source induced photovoltage obtained after treatment with 2-propanol solution indicates a high quality surface as surface recombination is largely suppressed due to passivation of surface gap states. In addition the carbon contamination is reduced three times using alcoholic while it is increased by a factor of 1.4 with aqueous solution.

Typ des Eintrags: Artikel
Erschienen: 2014
Autor(en): Lebedev, Mikhail V. ; Mayer, Thomas
Art des Eintrags: Bibliographie
Titel: Superior electronic passivation of n-GaP(100) surface using alcoholic as compared to aqueous ammonium sulfide solution: Wet processing studied with synchrotron photoelectron spectroscopy
Sprache: Englisch
Publikationsjahr: September 2014
Verlag: WILEY-VCH Verlag GmbH & Co. KGaA
Titel der Zeitschrift, Zeitung oder Schriftenreihe: physica status solidi (a)
Jahrgang/Volume einer Zeitschrift: 211
(Heft-)Nummer: 9
DOI: 10.1002/pssa.201330402
Kurzbeschreibung (Abstract):

The chemical composition and the electronic properties of the n-GaP(100) surface treated with ammonium sulfide dissolved in water versus 2-propanol is investigated using synchrotron-radiation photoemission spectroscopy (SXPS). Chemical composition and electronic structure of the passivated surfaces vary in dependence of the solvent used. The valence band maximum and the core level binding energies of the sulfide layers measured in the most surface sensitive mode are found at 1.0 and 0.75–0.9 eV higher binding energies using 2-propanol versus aqueous solution. This flattening of bands actually is related to photovoltage induced by synchrotron radiation. The strong source induced photovoltage obtained after treatment with 2-propanol solution indicates a high quality surface as surface recombination is largely suppressed due to passivation of surface gap states. In addition the carbon contamination is reduced three times using alcoholic while it is increased by a factor of 1.4 with aqueous solution.

Freie Schlagworte: ammonium sulfide, electronic passivation, GaP, photoelectron spectroscopy, photovoltage, surface recombination
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 26 Feb 2015 10:08
Letzte Änderung: 26 Feb 2015 10:08
PPN:
Sponsoren: This work was supported in part by Russian Foundation for Basic Research (project 13-02-00540a).
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