TU Darmstadt / ULB / TUbiblio

Cobalt oxide thin film low pressure metal-organic chemical vapor deposition

Schmid, Stefan and Hausbrand, René and Jaegermann, Wolfram (2014):
Cobalt oxide thin film low pressure metal-organic chemical vapor deposition.
In: Thin Solid Films, pp. 8-13, 567, ISSN 00406090,
[Article]

Item Type: Article
Erschienen: 2014
Creators: Schmid, Stefan and Hausbrand, René and Jaegermann, Wolfram
Title: Cobalt oxide thin film low pressure metal-organic chemical vapor deposition
Language: English
Journal or Publication Title: Thin Solid Films
Volume: 567
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Exzellenzinitiative
Exzellenzinitiative > Clusters of Excellence
Zentrale Einrichtungen
Exzellenzinitiative > Clusters of Excellence > Center of Smart Interfaces (CSI)
Date Deposited: 17 Dec 2014 14:01
Identification Number: doi:10.1016/j.tsf.2014.07.029
Export:
Suche nach Titel in: TUfind oder in Google

Optionen (nur für Redakteure)

View Item View Item