Gigler, Alexander M. ; Dietz, Christian ; Baumann, Maximilian ; Martinez, Nicolás F. ; García, Ricardo ; Stark, Robert W. (2012)
Repulsive bimodal atomic force microscopy on polymers.
In: Beilstein Journal of Nanotechnology, 3
doi: 10.3762/bjnano.3.52
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Bimodal atomic force microscopy can provide high-resolution images of polymers. In the bimodal operation mode, two eigenmodes of the cantilever are driven simultaneously. When examining polymers, an effective mechanical contact is often required between the tip and the sample to obtain compositional contrast, so particular emphasis was placed on the repulsive regime of dynamic force microscopy. We thus investigated bimodal imaging on a polystyrene-block-polybutadiene diblock copolymer surface and on polystyrene. The attractive operation regime was only stable when the amplitude of the second eigenmode was kept small compared to the amplitude of the fundamental mode. To clarify the influence of the higher eigenmode oscillation on the image quality, the amplitude ratio of both modes was systematically varied. Fourier analysis of the time series recorded during imaging showed frequency mixing. However, these spurious signals were at least two orders of magnitude smaller than the first two fundamental eigenmodes. Thus, repulsive bimodal imaging of polymer surfaces yields a good signal quality for amplitude ratios smaller than A(01)/A(02) = 10:1 without affecting the topography feedback.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2012 |
| Autor(en): | Gigler, Alexander M. ; Dietz, Christian ; Baumann, Maximilian ; Martinez, Nicolás F. ; García, Ricardo ; Stark, Robert W. |
| Art des Eintrags: | Bibliographie |
| Titel: | Repulsive bimodal atomic force microscopy on polymers |
| Sprache: | Englisch |
| Publikationsjahr: | Juni 2012 |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Beilstein Journal of Nanotechnology |
| Jahrgang/Volume einer Zeitschrift: | 3 |
| DOI: | 10.3762/bjnano.3.52 |
| Kurzbeschreibung (Abstract): | Bimodal atomic force microscopy can provide high-resolution images of polymers. In the bimodal operation mode, two eigenmodes of the cantilever are driven simultaneously. When examining polymers, an effective mechanical contact is often required between the tip and the sample to obtain compositional contrast, so particular emphasis was placed on the repulsive regime of dynamic force microscopy. We thus investigated bimodal imaging on a polystyrene-block-polybutadiene diblock copolymer surface and on polystyrene. The attractive operation regime was only stable when the amplitude of the second eigenmode was kept small compared to the amplitude of the fundamental mode. To clarify the influence of the higher eigenmode oscillation on the image quality, the amplitude ratio of both modes was systematically varied. Fourier analysis of the time series recorded during imaging showed frequency mixing. However, these spurious signals were at least two orders of magnitude smaller than the first two fundamental eigenmodes. Thus, repulsive bimodal imaging of polymer surfaces yields a good signal quality for amplitude ratios smaller than A(01)/A(02) = 10:1 without affecting the topography feedback. |
| Freie Schlagworte: | bimodal AFM imaging, diblock copolymer, polybutadiene, polystyrene |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Physics of Surfaces Exzellenzinitiative Exzellenzinitiative > Exzellenzcluster Zentrale Einrichtungen Exzellenzinitiative > Exzellenzcluster > Center of Smart Interfaces (CSI) |
| Hinterlegungsdatum: | 16 Jun 2014 11:04 |
| Letzte Änderung: | 29 Jan 2019 08:30 |
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