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Simulation and Experimental Verification: Dopant-free Si-Nanowire CMOS Technology on Silicon-on-Insulator Material

Schwalke, Udo and Wessely, Frank and Krauss, Tillmann (2013):
Simulation and Experimental Verification: Dopant-free Si-Nanowire CMOS Technology on Silicon-on-Insulator Material.
In: 8th International Design and Test Symposium (IDT), Marrakesh, Morocco, 16.-18.12.2013, [Online-Edition: http://idtsymposium.org/],
[Conference or Workshop Item]

Official URL: http://idtsymposium.org/
Item Type: Conference or Workshop Item
Erschienen: 2013
Creators: Schwalke, Udo and Wessely, Frank and Krauss, Tillmann
Title: Simulation and Experimental Verification: Dopant-free Si-Nanowire CMOS Technology on Silicon-on-Insulator Material
Language: English
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: 8th International Design and Test Symposium (IDT)
Event Location: Marrakesh, Morocco
Event Dates: 16.-18.12.2013
Date Deposited: 31 Mar 2014 07:32
Official URL: http://idtsymposium.org/
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