Schwalke, Udo and Wessely, Frank and Krauss, Tillmann (2013):
Simulation and Experimental Verification: Dopant-free Si-Nanowire CMOS Technology on Silicon-on-Insulator Material.
In: 8th International Design and Test Symposium (IDT), Marrakesh, Morocco, 16.-18.12.2013, [Online-Edition: http://idtsymposium.org/],
[Conference or Workshop Item]
Official URL: http://idtsymposium.org/
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 2013 |
| Creators: | Schwalke, Udo and Wessely, Frank and Krauss, Tillmann |
| Title: | Simulation and Experimental Verification: Dopant-free Si-Nanowire CMOS Technology on Silicon-on-Insulator Material |
| Language: | English |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Event Title: | 8th International Design and Test Symposium (IDT) |
| Event Location: | Marrakesh, Morocco |
| Event Dates: | 16.-18.12.2013 |
| Date Deposited: | 31 Mar 2014 07:32 |
| Official URL: | http://idtsymposium.org/ |
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