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Electron-beam-induced direct etching of graphene

Thiele, Cornelius and Felten, Alexandre and Echtermeyer, Tim J. and Ferrari, Andrea C. and Casiraghi, Cinzia and Löhneysen, Hilbert von and Krupke, Ralph (2013):
Electron-beam-induced direct etching of graphene.
In: Carbon, 64Elsevier Science Publishing, pp. 84-91, ISSN 00086223,
[Online-Edition: http://dx.doi.org/10.1016/j.carbon.2013.07.038],
[Article]

Abstract

We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile.

Item Type: Article
Erschienen: 2013
Creators: Thiele, Cornelius and Felten, Alexandre and Echtermeyer, Tim J. and Ferrari, Andrea C. and Casiraghi, Cinzia and Löhneysen, Hilbert von and Krupke, Ralph
Title: Electron-beam-induced direct etching of graphene
Language: English
Abstract:

We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile.

Journal or Publication Title: Carbon
Volume: 64
Publisher: Elsevier Science Publishing
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Fachgebiet Molekulare Nanostrukturen
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 18 Oct 2013 07:36
Official URL: http://dx.doi.org/10.1016/j.carbon.2013.07.038
Identification Number: doi:10.1016/j.carbon.2013.07.038
Funders: We acknowledge funding from the Karlsruhe Nano Micro Facility (KNMF), a Helmholtz Research Infrastructure at Karlsruhe Institute of Technology, the Alexander von Humboldt Foundation, ERC grant NANOPOTS, EPSRC grants EP/K01711X/1, EP/K017144/1, , EU Grants RODIN and GENIUS, CareRAMM, a Royal Society Wolfson Research Merit Award and the Cambridge Nokia Research Centre.
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