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Characterization of U-based thin films: the UFe2+xcase

Kim-Ngan, Nhu-T. H. ; Havela, L. ; Adamska, A. M. ; Danis, S. ; Pesicka, J. ; Macl, J. ; Eloirdi, R. ; Huber, F. ; Gouder, T. ; Balogh, A. G. (2011)
Characterization of U-based thin films: the UFe2+xcase.
In: Journal of Physics: Conference Series, 303 (1)
doi: 10.1088/1742-6596/303/1/012012
Artikel, Bibliographie

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Kurzbeschreibung (Abstract)

We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The Xray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0.

Typ des Eintrags: Artikel
Erschienen: 2011
Autor(en): Kim-Ngan, Nhu-T. H. ; Havela, L. ; Adamska, A. M. ; Danis, S. ; Pesicka, J. ; Macl, J. ; Eloirdi, R. ; Huber, F. ; Gouder, T. ; Balogh, A. G.
Art des Eintrags: Bibliographie
Titel: Characterization of U-based thin films: the UFe2+xcase
Sprache: Englisch
Publikationsjahr: 2011
Verlag: IOP Publishing
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Journal of Physics: Conference Series
Jahrgang/Volume einer Zeitschrift: 303
(Heft-)Nummer: 1
DOI: 10.1088/1742-6596/303/1/012012
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Kurzbeschreibung (Abstract):

We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The Xray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0.

Zusätzliche Informationen:

Joint European Magnetic Symposia – JEMS 2010

Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
Hinterlegungsdatum: 12 Dez 2012 12:23
Letzte Änderung: 24 Jan 2024 07:27
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