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Electrochemical porosity evaluation of thin films on iron base materials

Lee, Y.-Y. and Heck, C. and Chun, S.-Y. and Chayahara, A. and Horino, Y. and Ensinger, W. and Enders, B. :
Electrochemical porosity evaluation of thin films on iron base materials.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(02)00313-4]
In: Surface and Coatings Technology, 158-15 (158-159) pp. 588-593. ISSN 02578972
[Article] , (2002)

Official URL: http://dx.doi.org/10.1016/S0257-8972(02)00313-4

Abstract

Corrosion properties of bulk materials coated with thin protective films are not only dependent on the electrochemical properties of the bulk materials and the intrinsic corrosion properties of thin protective films but also to a high degree on the films porosity. It is therefore necessary to know about the porosity in order to be able to control and optimize it with the deposition process. In this contribution we introduce a technique to measure the porosity by means of an electrochemical technique. Model systems are chosen, i.e. thin iron films deposited on silicon wafers were coated with tungsten and carbon thin protective films. The depositions were done with coaxial arc deposition, evaporation, and plasma immersion ion assisted sputter deposition. Raman measurements, Rutherford backscattering spectroscopy, raster electron microscopy, atomic force microscopy and electrochemical measurements were carried out to characterize the films.

Item Type: Article
Erschienen: 2002
Creators: Lee, Y.-Y. and Heck, C. and Chun, S.-Y. and Chayahara, A. and Horino, Y. and Ensinger, W. and Enders, B.
Title: Electrochemical porosity evaluation of thin films on iron base materials
Language: English
Abstract:

Corrosion properties of bulk materials coated with thin protective films are not only dependent on the electrochemical properties of the bulk materials and the intrinsic corrosion properties of thin protective films but also to a high degree on the films porosity. It is therefore necessary to know about the porosity in order to be able to control and optimize it with the deposition process. In this contribution we introduce a technique to measure the porosity by means of an electrochemical technique. Model systems are chosen, i.e. thin iron films deposited on silicon wafers were coated with tungsten and carbon thin protective films. The depositions were done with coaxial arc deposition, evaporation, and plasma immersion ion assisted sputter deposition. Raman measurements, Rutherford backscattering spectroscopy, raster electron microscopy, atomic force microscopy and electrochemical measurements were carried out to characterize the films.

Journal or Publication Title: Surface and Coatings Technology
Volume: 158-15
Number: 158-159
Publisher: Elsevier
Uncontrolled Keywords: Coaxial arc deposition, Plasma immersion ion assisted sputter deposition, Corrosion protection, Modelling, Iron, Carbon and tungsten thin films
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
Date Deposited: 16 Nov 2012 09:53
Official URL: http://dx.doi.org/10.1016/S0257-8972(02)00313-4
Identification Number: doi:10.1016/S0257-8972(02)00313-4
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