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Electrochemical determination of corrosion protection ability of fullerene thin films treated by radiofrequency plasma

Sittner, F. ; Enders, B. ; Ensinger, W. (2004)
Electrochemical determination of corrosion protection ability of fullerene thin films treated by radiofrequency plasma.
In: Thin Solid Films, 459 (1-2)
doi: 10.1016/j.tsf.2003.12.096
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Fullerenes were deposited on iron substrates via thermal evaporation under high vacuum conditions at room temperature. After deposition the samples were subjected to ion irradiation from a radiofrequency plasma with the samples held at room temperature. The gases used for irradiation were argon and nitrogen, respectively. The process leads to an opening of the fullerene cage structure and forms an extended network of amorphous carbon in the upper region of the fullerene layer. Changes in the structure of the films due to the treatment were analyzed by Raman spectroscopy. In order to determine the porosity of as-deposited and post-deposition treated fullerene films, electrochemical polarization measurements were carried out in aqueous corrosive environment. Thus the dissolution current of the iron substrate through the films was measured. The results show that plasma treatment leads to formation of amorphous carbon with a considerably lower porosity than the fullerene film. Hence, ion irradiation improves the coverage of the film and its corrosion protection ability.

Typ des Eintrags: Artikel
Erschienen: 2004
Autor(en): Sittner, F. ; Enders, B. ; Ensinger, W.
Art des Eintrags: Bibliographie
Titel: Electrochemical determination of corrosion protection ability of fullerene thin films treated by radiofrequency plasma
Sprache: Englisch
Publikationsjahr: 1 Juli 2004
Verlag: Elsevier
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Thin Solid Films
Jahrgang/Volume einer Zeitschrift: 459
(Heft-)Nummer: 1-2
DOI: 10.1016/j.tsf.2003.12.096
Kurzbeschreibung (Abstract):

Fullerenes were deposited on iron substrates via thermal evaporation under high vacuum conditions at room temperature. After deposition the samples were subjected to ion irradiation from a radiofrequency plasma with the samples held at room temperature. The gases used for irradiation were argon and nitrogen, respectively. The process leads to an opening of the fullerene cage structure and forms an extended network of amorphous carbon in the upper region of the fullerene layer. Changes in the structure of the films due to the treatment were analyzed by Raman spectroscopy. In order to determine the porosity of as-deposited and post-deposition treated fullerene films, electrochemical polarization measurements were carried out in aqueous corrosive environment. Thus the dissolution current of the iron substrate through the films was measured. The results show that plasma treatment leads to formation of amorphous carbon with a considerably lower porosity than the fullerene film. Hence, ion irradiation improves the coverage of the film and its corrosion protection ability.

Freie Schlagworte: Ion beam, Fullerene, Corrosion, Iron, Amorphous carbon, Thin films, Raman spectroscopy
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
Hinterlegungsdatum: 06 Sep 2012 07:52
Letzte Änderung: 30 Aug 2018 12:46
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