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Crystallization in low-energy deposition of titanium ions

Kiuchi, Masato and Matsumoto, Takashi and Yoshikawa, Takafumi and Goto, Seiichi and Ensinger, Wolfgang :
Crystallization in low-energy deposition of titanium ions.
[Online-Edition: http://dx.doi.org/10.1016/S0927-7765(00)00165-X]
In: Colloids and Surfaces B: Biointerfaces, 19 (3) pp. 269-273. ISSN 09277765
[Article] , (2000)

Official URL: http://dx.doi.org/10.1016/S0927-7765(00)00165-X

Abstract

To investigate crystallization in the ion beam deposition process, titanium ions were deposited on silicon wafers at 105 and 55 eV. As titanium is an active metal, titanium compounds are formed by absorbing backfilled or residual gas. At energy levels of 105 or 55 eV, titanium crystallizes in a NaCl-type titanium compound with the backfilling of air. In all samples, (110)-oriented crystals grew with a rectangular lattice arrangement of titanium atoms. The open channel 〈110〉 of preferentially oriented crystal growth was parallel to the direction of incident ions normal to the substrate surface.

Item Type: Article
Erschienen: 2000
Creators: Kiuchi, Masato and Matsumoto, Takashi and Yoshikawa, Takafumi and Goto, Seiichi and Ensinger, Wolfgang
Title: Crystallization in low-energy deposition of titanium ions
Language: English
Abstract:

To investigate crystallization in the ion beam deposition process, titanium ions were deposited on silicon wafers at 105 and 55 eV. As titanium is an active metal, titanium compounds are formed by absorbing backfilled or residual gas. At energy levels of 105 or 55 eV, titanium crystallizes in a NaCl-type titanium compound with the backfilling of air. In all samples, (110)-oriented crystals grew with a rectangular lattice arrangement of titanium atoms. The open channel 〈110〉 of preferentially oriented crystal growth was parallel to the direction of incident ions normal to the substrate surface.

Journal or Publication Title: Colloids and Surfaces B: Biointerfaces
Volume: 19
Number: 3
Publisher: Elsevier
Uncontrolled Keywords: Crystallization, Ion beam deposition, Preferred orientation, Titanium
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 25 Jun 2012 10:58
Official URL: http://dx.doi.org/10.1016/S0927-7765(00)00165-X
Identification Number: doi:10.1016/S0927-7765(00)00165-X
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