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High-Temperature Healing of Lithographically Introduced Cracks in Sapphire

Rödel, Jürgen and Glaeser, Andreas M. (1990):
High-Temperature Healing of Lithographically Introduced Cracks in Sapphire.
In: Journal of the American Ceramic Society, pp. 592-601, 73, (3), ISSN 0002-7820,
[Online-Edition: http://dx.doi.org/10.1111/j.1151-2916.1990.tb06558.x],
[Article]

Abstract

A new method for producing controlled-geometry, controlled-crystallography, cracklike defects using photolithography has been developed. The method has been applied to sapphire, and used to study crack healing behavior at 1800°C. Effects of crack face and crack perimeter crystallography, crack face microstructure, and impurities on healing behavior have been identified.

Item Type: Article
Erschienen: 1990
Creators: Rödel, Jürgen and Glaeser, Andreas M.
Title: High-Temperature Healing of Lithographically Introduced Cracks in Sapphire
Language: English
Abstract:

A new method for producing controlled-geometry, controlled-crystallography, cracklike defects using photolithography has been developed. The method has been applied to sapphire, and used to study crack healing behavior at 1800°C. Effects of crack face and crack perimeter crystallography, crack face microstructure, and impurities on healing behavior have been identified.

Journal or Publication Title: Journal of the American Ceramic Society
Volume: 73
Number: 3
Uncontrolled Keywords: lithography; sapphire; cracks; crystallography; microstructure
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Nonmetallic-Inorganic Materials
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 13 Jun 2012 11:53
Official URL: http://dx.doi.org/10.1111/j.1151-2916.1990.tb06558.x
Identification Number: doi:10.1111/j.1151-2916.1990.tb06558.x
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