TU Darmstadt / ULB / TUbiblio

Effect of Ta buffer and NiFe seed layers on pulsed-DC magnetron sputtered Ir20Mn80/Co90Fe10 exchange bias

Öksüzoğlu, Ramis Mustafa and Yıldırım, Mustafa and Çınar, Hakan and Hildebrandt, Erwin and Alff, Lambert (2011):
Effect of Ta buffer and NiFe seed layers on pulsed-DC magnetron sputtered Ir20Mn80/Co90Fe10 exchange bias.
In: Journal of Magnetism and Magnetic Materials, pp. 1827-1834, 323, (13), ISSN 03048853, [Online-Edition: http://dx.doi.org/10.1016/j.jmmm.2011.02.021],
[Article]

Abstract

A systematic investigation has been done on the correlation between texture, grain size evolution and magnetic properties in Ta/Ni81Fe19/Ir20Mn80/Co90Fe10/Ta exchange bias in dependence of Ta buffer and NiFe seed layer thickness in the range of 2–10 nm, deposited by pulsed DC magnetron sputtering technique. A strong dependence of 〈1 1 1〉 texture on the Ta/NiFe thicknesses was found, where the reducing and increasing texture was correlated with exchange bias field and unidirectional anisotropy energy constant at both NiFe/IrMn and IrMn/CoFe interfaces. However, a direct correlation between average grain size in IrMn and Hex and Hc was not observed. L12 phase IrMn3 could be formed by thickness optimization of Ta/NiFe layers by deposition at room temperature, for which the maximum exchange coupling parameters were achieved. We conclude finally that the coercivity is mainly influenced by texture induced interfacial effects at NiFe/IrMn/CoFe interfaces developing with Ta/NiFe thicknesses.

Item Type: Article
Erschienen: 2011
Creators: Öksüzoğlu, Ramis Mustafa and Yıldırım, Mustafa and Çınar, Hakan and Hildebrandt, Erwin and Alff, Lambert
Title: Effect of Ta buffer and NiFe seed layers on pulsed-DC magnetron sputtered Ir20Mn80/Co90Fe10 exchange bias
Language: English
Abstract:

A systematic investigation has been done on the correlation between texture, grain size evolution and magnetic properties in Ta/Ni81Fe19/Ir20Mn80/Co90Fe10/Ta exchange bias in dependence of Ta buffer and NiFe seed layer thickness in the range of 2–10 nm, deposited by pulsed DC magnetron sputtering technique. A strong dependence of 〈1 1 1〉 texture on the Ta/NiFe thicknesses was found, where the reducing and increasing texture was correlated with exchange bias field and unidirectional anisotropy energy constant at both NiFe/IrMn and IrMn/CoFe interfaces. However, a direct correlation between average grain size in IrMn and Hex and Hc was not observed. L12 phase IrMn3 could be formed by thickness optimization of Ta/NiFe layers by deposition at room temperature, for which the maximum exchange coupling parameters were achieved. We conclude finally that the coercivity is mainly influenced by texture induced interfacial effects at NiFe/IrMn/CoFe interfaces developing with Ta/NiFe thicknesses.

Journal or Publication Title: Journal of Magnetism and Magnetic Materials
Volume: 323
Number: 13
Uncontrolled Keywords: Magnetic anisotropy, Magnetic properties of monolayers and thin films. Texture, Pulsed DC magnetron sputtering
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Advanced Thin Film Technology
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 30 Mar 2012 09:25
Official URL: http://dx.doi.org/10.1016/j.jmmm.2011.02.021
Identification Number: doi:10.1016/j.jmmm.2011.02.021
Funders: TUBITAK Grant no MAG-106M517, Directorate for Scientific Research Projects of University Anadolu Grant no BAP-050255, Prime Ministry State Planning Organization Grant no DPT-2004-06
Export:

Optionen (nur für Redakteure)

View Item View Item