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Epitaxial Growth of Superconducting Eu2-xCexCuO4Thin Films

Krockenberger, Yoshiharu and Kurian, Jose and Naito, Michio and Alff, Lambert (2008):
Epitaxial Growth of Superconducting Eu2-xCexCuO4Thin Films.
In: Japanese Journal of Applied Physics, pp. 6307-6309, 47, (8), ISSN 0021-4922,
[Online-Edition: http://dx.doi.org/10.1143/JJAP.47.6307],
[Article]

Abstract

We have grown (00l)-oriented thin films of Eu2-xCexCuO4 on (001) SrTiO3 with cerium composition in the range 0≤x≤0.22 by reactive molecular beam epitaxy and characterized them by X-ray diffraction and transport measurements. A systematic change in the c-axis length upon cerium doping was observed indicating that single-phase films were obtained for the whole doping range up to the solubility limit at x=0.22. Superconductivity appeared within a cerium concentration of 0.14≤x≤0.19. Compared to other electron doped cuprates, the superconducting phase space and maximal critical temperature is reduced, and the point of optimal doping is shifted to a higher doping level.

Item Type: Article
Erschienen: 2008
Creators: Krockenberger, Yoshiharu and Kurian, Jose and Naito, Michio and Alff, Lambert
Title: Epitaxial Growth of Superconducting Eu2-xCexCuO4Thin Films
Language: English
Abstract:

We have grown (00l)-oriented thin films of Eu2-xCexCuO4 on (001) SrTiO3 with cerium composition in the range 0≤x≤0.22 by reactive molecular beam epitaxy and characterized them by X-ray diffraction and transport measurements. A systematic change in the c-axis length upon cerium doping was observed indicating that single-phase films were obtained for the whole doping range up to the solubility limit at x=0.22. Superconductivity appeared within a cerium concentration of 0.14≤x≤0.19. Compared to other electron doped cuprates, the superconducting phase space and maximal critical temperature is reduced, and the point of optimal doping is shifted to a higher doping level.

Journal or Publication Title: Japanese Journal of Applied Physics
Volume: 47
Number: 8
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Advanced Thin Film Technology
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 29 Mar 2012 11:13
Official URL: http://dx.doi.org/10.1143/JJAP.47.6307
Identification Number: doi:10.1143/JJAP.47.6307
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