Klein, Andreas and Körber, C. and Wachau, A. and Säuberlich, F. and Gassenbauer, Y. and Schafranek, R. and Harvey, S. P. and Mason, T. O. (2009):
Surface potentials of magnetron sputtered transparent conducting oxides.
In: Thin Solid Films, 518 (4), pp. 1197-1203, ISSN 00406090,
[Online-Edition: http://dx.doi.org/10.1016/j.tsf.2009.05.057],
[Article]
Abstract
Work functions, ionization potentials (electron affinities) and Fermi level positions measured in-situ by photoelectron spectroscopy at surfaces of transparent conducting oxides are presented. Thin films of ZnO, ZnO:Al, SnO2, SnO2:Sb, In2O3, In2O3:Sn, and In2O3:(Zn,Sn) are prepared by magnetron sputtering. The Fermi level position is strongly affected by the oxygen content in the sputter gas. The ionization potential and work function of ZnO are strongly affected by surface orientation. In contrast, SnO2-based and In2O3-based materials show pronounced changes of ionization potential and work function induced by surface oxidation and reduction. Unlike SnO2, the oxidation of the In2O3-based TCO surfaces does not occur during deposition but can be induced by post-deposition treatments.
| Item Type: | Article |
|---|---|
| Erschienen: | 2009 |
| Creators: | Klein, Andreas and Körber, C. and Wachau, A. and Säuberlich, F. and Gassenbauer, Y. and Schafranek, R. and Harvey, S. P. and Mason, T. O. |
| Title: | Surface potentials of magnetron sputtered transparent conducting oxides |
| Language: | English |
| Abstract: | Work functions, ionization potentials (electron affinities) and Fermi level positions measured in-situ by photoelectron spectroscopy at surfaces of transparent conducting oxides are presented. Thin films of ZnO, ZnO:Al, SnO2, SnO2:Sb, In2O3, In2O3:Sn, and In2O3:(Zn,Sn) are prepared by magnetron sputtering. The Fermi level position is strongly affected by the oxygen content in the sputter gas. The ionization potential and work function of ZnO are strongly affected by surface orientation. In contrast, SnO2-based and In2O3-based materials show pronounced changes of ionization potential and work function induced by surface oxidation and reduction. Unlike SnO2, the oxidation of the In2O3-based TCO surfaces does not occur during deposition but can be induced by post-deposition treatments. |
| Journal or Publication Title: | Thin Solid Films |
| Volume: | 518 |
| Number: | 4 |
| Uncontrolled Keywords: | Work function; SnO2; In2O3; ZnO; TCO; Thin film; Magnetron sputtering; Photoemission |
| Divisions: | 11 Department of Materials and Earth Sciences 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences > Material Science > Surface Science Zentrale Einrichtungen DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres > CRC 595: Electrical fatigue DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres > CRC 595: Electrical fatigue > D - Component properties DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres > CRC 595: Electrical fatigue > D - Component properties > Subproject D3: Function and fatigue of oxide electrodes in organic light emitting diodes DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres DFG-Collaborative Research Centres (incl. Transregio) |
| Date Deposited: | 16 Sep 2011 12:36 |
| Official URL: | http://dx.doi.org/10.1016/j.tsf.2009.05.057 |
| Additional Information: | SFB 595 D3 |
| Identification Number: | doi:10.1016/j.tsf.2009.05.057 |
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