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Study of Pinholes in Ultrathin SiO2 by C-AFM Technique

Marathe, Vaibhav G. and Stefanov, Yordan and Schwalke, Udo and DasGupta, Nandita (2006):
Study of Pinholes in Ultrathin SiO2 by C-AFM Technique.
In: Thin Solid Films, pp. 11-14, 504, (1-2), [Online-Edition: http://dx.doi.org/10.1016/j.tsf.2005.09.019],
[Article]

Item Type: Article
Erschienen: 2006
Creators: Marathe, Vaibhav G. and Stefanov, Yordan and Schwalke, Udo and DasGupta, Nandita
Title: Study of Pinholes in Ultrathin SiO2 by C-AFM Technique
Language: English
Journal or Publication Title: Thin Solid Films
Volume: 504
Number: 1-2
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Date Deposited: 05 Jul 2011 06:46
Official URL: http://dx.doi.org/10.1016/j.tsf.2005.09.019
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