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CMP-based Gate Last High-K Integration

Endres, Ralf and Wessely, Frank and Schwalke, Udo (2008):
CMP-based Gate Last High-K Integration.
In: Proceedings of the 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), pp. 544-547, [Online-Edition: http://www.stw.nl/NR/rdonlyres/678497B6-D48F-4F76-94AF-EB589...],
[Article]

Item Type: Article
Erschienen: 2008
Creators: Endres, Ralf and Wessely, Frank and Schwalke, Udo
Title: CMP-based Gate Last High-K Integration
Language: English
Journal or Publication Title: Proceedings of the 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE)
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE)
Event Location: Veldhoven, Niederlande
Event Dates: 27.-28.11.2008
Date Deposited: 29 Jun 2011 09:46
Official URL: http://www.stw.nl/NR/rdonlyres/678497B6-D48F-4F76-94AF-EB589...
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