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Scaling of the Damascene Metal Gate Integration Process via Electron Beam Lithography

Wessely, Frank and Endres, Ralf and Schwalke, Udo (2009):
Scaling of the Damascene Metal Gate Integration Process via Electron Beam Lithography.
In: 3rd International Conference on Signals, Circuits and Systems (SCS), [Online-Edition: http://dx.doi.org/10.1109/ICSCS.2009.5414217],
[Article]

Item Type: Article
Erschienen: 2009
Creators: Wessely, Frank and Endres, Ralf and Schwalke, Udo
Title: Scaling of the Damascene Metal Gate Integration Process via Electron Beam Lithography
Language: English
Journal or Publication Title: 3rd International Conference on Signals, Circuits and Systems (SCS)
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: 3rd International Conference on Signals, Circuits and Systems (SCS)
Event Location: Djerba, Tunesien
Event Dates: 06.-08.11.2009
Date Deposited: 28 Jun 2011 14:14
Official URL: http://dx.doi.org/10.1109/ICSCS.2009.5414217
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