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Chemical composition, crystallographic structure and impedance spectroscopy of titanium oxynitride TiNxOy thin films

Radecka, M. ; Pamula, E. ; Trenczek-Zajac, A. ; Zakrzewska, K. ; Brudnik, A. ; Kusior, E. ; Kim-Ngan, N.-T. H. ; Balogh, A. G. (2011)
Chemical composition, crystallographic structure and impedance spectroscopy of titanium oxynitride TiNxOy thin films.
In: Solid State Ionics, 192 (1)
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Titanium oxynitride TiNxOy thin films have been deposited by DC-pulsed magnetron sputtering from Ti target in the Ar + N2 + O2 reactive atmosphere controlled by plasma emission spectroscopy. Correlation between chemical composition and crystallographic structure of thin films has been determined and presented in the form of the pseudo-equilibrium ternary phase diagram. The atomic N/Ti and O/Ti ratios have been derived from Rutherford backscattering (RBS) measurements. X-ray diffraction at grazing incidence has revealed formation of defective TiN-TiO solid solutions. The surface roughness estimated from atomic force microscopy (AFM) surface images decreases with increasing oxygen content in the films, in accordance with the progressive sample amorphisation. Impedance spectroscopy measurements indicate that the electrical conductivity changes its character from metallic to semiconducting with increasing oxygen content in TiNxOy thin films.

Typ des Eintrags: Artikel
Erschienen: 2011
Autor(en): Radecka, M. ; Pamula, E. ; Trenczek-Zajac, A. ; Zakrzewska, K. ; Brudnik, A. ; Kusior, E. ; Kim-Ngan, N.-T. H. ; Balogh, A. G.
Art des Eintrags: Bibliographie
Titel: Chemical composition, crystallographic structure and impedance spectroscopy of titanium oxynitride TiNxOy thin films
Sprache: Englisch
Publikationsjahr: 16 Juni 2011
Verlag: Elsevier Science Publishing Company
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Solid State Ionics
Jahrgang/Volume einer Zeitschrift: 192
(Heft-)Nummer: 1
URL / URN: http://www.sciencedirect.com/science/article/pii/S0167273810...
Kurzbeschreibung (Abstract):

Titanium oxynitride TiNxOy thin films have been deposited by DC-pulsed magnetron sputtering from Ti target in the Ar + N2 + O2 reactive atmosphere controlled by plasma emission spectroscopy. Correlation between chemical composition and crystallographic structure of thin films has been determined and presented in the form of the pseudo-equilibrium ternary phase diagram. The atomic N/Ti and O/Ti ratios have been derived from Rutherford backscattering (RBS) measurements. X-ray diffraction at grazing incidence has revealed formation of defective TiN-TiO solid solutions. The surface roughness estimated from atomic force microscopy (AFM) surface images decreases with increasing oxygen content in the films, in accordance with the progressive sample amorphisation. Impedance spectroscopy measurements indicate that the electrical conductivity changes its character from metallic to semiconducting with increasing oxygen content in TiNxOy thin films.

Freie Schlagworte: Impedance spectroscopy, Rutherford backscattering, Thin films, Titanium oxynitrides
Zusätzliche Informationen:

Proceedings of the 17th International Conference on Solid State Ionics

Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 15 Jun 2011 14:52
Letzte Änderung: 05 Mär 2013 09:48
PPN:
Sponsoren: The financial support of the Polish Ministry of Education and Science (2009-2012) within the project NN515 080 637 is highly acknowledged., Ion Beam Analysis were performed within the scope of DAAD project D/08/07729 between Poland and Germany and MNiSW project No. 651/N-DAAD/2010/0., One of the authors (A.T.-Z.) would like to kindly acknowledge the Foundation of Polish Science for financial support.
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