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Scintillation Screen Investigations for High-Current Ion Beams

Gütlich, Eiko ; Forck, P. ; Ensinger, Wolfgang ; Walasek-Höhne, B. (2010)
Scintillation Screen Investigations for High-Current Ion Beams.
In: Nuclear Science, IEEE Transactions on, 57 (3)
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

At GSI, the Helmholtz Centre for Ion Research, the properties of scintillation screens, irradiated by an ion beam, were studied. For various materials, the different ion beams H+, C2+, Ar10+, Ni9+, Ta24+, and U28+ in the energy range from 4.8-11.4 MeV/u were applied with currents ranging from nA to some mA, delivered by the heavy ion LINAC at GSI. Scintillation screens are widely used for qualitative ion beam profile monitoring. However, precise measurements of the beam profile yield ambivalent results, especially for high beam currents. Thus, the properties (light yield, beam width, and higher statistical moments) of well-known scintillators, ceramic materials, and different quartz glasses are compared. The image of each ion beam pulse was recorded by a digital CCD camera and individually evaluated. A change of the imaged ion beam shape was observed for some materials. The recorded beam profile shows dependence on the scintillator material. Even for low beam intensities (17 nA) a difference in the beam width of about 25% was measured. Additionally, the light yield and beam width depend significantly on the screen temperature, which is increased by the ion impact. For ZrO2 : Al the influence of the screen temperature on the statistical moments was investigated. Furthermore the spectra of scintillation screens were studied in the region from 350 to 750 nm for the irradiation with H+ and Ta24+ ions. Empirical results are discussed and give rise to further investigations on the materials.

Typ des Eintrags: Artikel
Erschienen: 2010
Autor(en): Gütlich, Eiko ; Forck, P. ; Ensinger, Wolfgang ; Walasek-Höhne, B.
Art des Eintrags: Bibliographie
Titel: Scintillation Screen Investigations for High-Current Ion Beams
Sprache: Englisch
Publikationsjahr: 14 Juni 2010
Verlag: IEEE Nuclear and Plasma Sciences Society
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Nuclear Science, IEEE Transactions on
Jahrgang/Volume einer Zeitschrift: 57
(Heft-)Nummer: 3
URL / URN: http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=5485...
Kurzbeschreibung (Abstract):

At GSI, the Helmholtz Centre for Ion Research, the properties of scintillation screens, irradiated by an ion beam, were studied. For various materials, the different ion beams H+, C2+, Ar10+, Ni9+, Ta24+, and U28+ in the energy range from 4.8-11.4 MeV/u were applied with currents ranging from nA to some mA, delivered by the heavy ion LINAC at GSI. Scintillation screens are widely used for qualitative ion beam profile monitoring. However, precise measurements of the beam profile yield ambivalent results, especially for high beam currents. Thus, the properties (light yield, beam width, and higher statistical moments) of well-known scintillators, ceramic materials, and different quartz glasses are compared. The image of each ion beam pulse was recorded by a digital CCD camera and individually evaluated. A change of the imaged ion beam shape was observed for some materials. The recorded beam profile shows dependence on the scintillator material. Even for low beam intensities (17 nA) a difference in the beam width of about 25% was measured. Additionally, the light yield and beam width depend significantly on the screen temperature, which is increased by the ion impact. For ZrO2 : Al the influence of the screen temperature on the statistical moments was investigated. Furthermore the spectra of scintillation screens were studied in the region from 350 to 750 nm for the irradiation with H+ and Ta24+ ions. Empirical results are discussed and give rise to further investigations on the materials.

Freie Schlagworte: Accelerator beam line instrumentation, ion accelerators, ion radiation effects, luminescent devices, particle beam instrumentation, radiation effects, scintillator devices, spectral analysis
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 24 Aug 2010 15:45
Letzte Änderung: 05 Mär 2013 09:36
PPN:
Sponsoren: Sponsored by IEEE Nuclear and Plasma Sciences Society
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