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Characterization of the porosity of thin zirconium oxide coatings prepared at low temperatures

Ugas-Carrion, Ruperto and Sittner, Falk and Ochs, C. J. and Flege, Stefan and Ensinger, Wolfgang (2009):
Characterization of the porosity of thin zirconium oxide coatings prepared at low temperatures.
In: Thin Solid Films, 517 (6), pp. 1967-1969. Elsevier Science Publishing Company, ISSN 00406090,
[Article]

Abstract

In this work we investigated the possibilities to reduce the porosity of thin protective zirconium oxide films deposited with the sol–gel technique at low temperatures. Electrochemical investigations showed that the concentration of the stabilizing agent acetylacetone is a crucial parameter for the protection performance of the zirconium oxide films and that it is possible to run the deposition process at much lower temperatures with the optimum stabilizer concentration. This allows the application of the process to sensitive substrates that cannot be treated at high temperatures and reduces energy costs as well. Characterization of the film structure with secondary ion mass spectrometry revealed that the stabilizing agent is responsible for the formation of a mixed oxide layer at the interface of substrate and coating. The thickness of this layer can be tuned with the concentration of the stabilizing agent.

Item Type: Article
Erschienen: 2009
Creators: Ugas-Carrion, Ruperto and Sittner, Falk and Ochs, C. J. and Flege, Stefan and Ensinger, Wolfgang
Title: Characterization of the porosity of thin zirconium oxide coatings prepared at low temperatures
Language: English
Abstract:

In this work we investigated the possibilities to reduce the porosity of thin protective zirconium oxide films deposited with the sol–gel technique at low temperatures. Electrochemical investigations showed that the concentration of the stabilizing agent acetylacetone is a crucial parameter for the protection performance of the zirconium oxide films and that it is possible to run the deposition process at much lower temperatures with the optimum stabilizer concentration. This allows the application of the process to sensitive substrates that cannot be treated at high temperatures and reduces energy costs as well. Characterization of the film structure with secondary ion mass spectrometry revealed that the stabilizing agent is responsible for the formation of a mixed oxide layer at the interface of substrate and coating. The thickness of this layer can be tuned with the concentration of the stabilizing agent.

Journal or Publication Title: Thin Solid Films
Journal volume: 517
Number: 6
Publisher: Elsevier Science Publishing Company
Uncontrolled Keywords: Thin films; Sol-gel; Interface; Zirconium; Porosity; Electrochemistry
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 29 Jun 2009 14:26
Official URL: http://dx.doi.org/10.1016/j.tsf.2008.10.005
Identification Number: doi:10.1016/j.tsf.2008.10.005
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