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Comparison of surface layers on copper, titanium and tantalum created by methane plasma-based ion implantation

Kraft, Gunther and Flege, Stefan and Baba, Koumei and Hatada, Ruriko and Ensinger, Wolfgang :
Comparison of surface layers on copper, titanium and tantalum created by methane plasma-based ion implantation.
[Online-Edition: http://dx.doi.org/10.1002/pssa.200778330]
In: physica status solidi (a), 205 (4) pp. 985-988. ISSN 00318965
[Article] , (2008)

Official URL: http://dx.doi.org/10.1002/pssa.200778330

Abstract

Two carbide forming metals, titanium and tantalum, and a typical non carbide former, copper, were treated by methane plasma immersion ion implantation. The polished metal samples were exposed to high voltage pulses at –20 kV in an atmosphere of methane. The lateral distribution of the carbon was investigated via electron probe microanalysis, the depth distribution of the respective metal, carbon and hydrogen was determined by secondary ion mass spectrometry. X-ray photoelectron spectroscopy in conjunction with argon sputtering showed the evolution of the binding conditions with depth. The phase composition of the samples was also analyzed by glancing incidence X-ray diffraction. The generated carbon layers exhibited considerable differences depending on the respective substrate. Although there was no carbide formation with the copper samples, some carbon was incorporated into the surfaces. On copper the lateral carbon distributions showed inhomogeneities whereas the appearances of the ones on titanium and tantalum were uniform. The resulting thickness of the carbon layer was not only dependent on the substrate material, but also on the process parameters.

Item Type: Article
Erschienen: 2008
Creators: Kraft, Gunther and Flege, Stefan and Baba, Koumei and Hatada, Ruriko and Ensinger, Wolfgang
Title: Comparison of surface layers on copper, titanium and tantalum created by methane plasma-based ion implantation
Language: English
Abstract:

Two carbide forming metals, titanium and tantalum, and a typical non carbide former, copper, were treated by methane plasma immersion ion implantation. The polished metal samples were exposed to high voltage pulses at –20 kV in an atmosphere of methane. The lateral distribution of the carbon was investigated via electron probe microanalysis, the depth distribution of the respective metal, carbon and hydrogen was determined by secondary ion mass spectrometry. X-ray photoelectron spectroscopy in conjunction with argon sputtering showed the evolution of the binding conditions with depth. The phase composition of the samples was also analyzed by glancing incidence X-ray diffraction. The generated carbon layers exhibited considerable differences depending on the respective substrate. Although there was no carbide formation with the copper samples, some carbon was incorporated into the surfaces. On copper the lateral carbon distributions showed inhomogeneities whereas the appearances of the ones on titanium and tantalum were uniform. The resulting thickness of the carbon layer was not only dependent on the substrate material, but also on the process parameters.

Journal or Publication Title: physica status solidi (a)
Volume: 205
Number: 4
Publisher: WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 24 Jun 2009 08:57
Official URL: http://dx.doi.org/10.1002/pssa.200778330
Identification Number: doi:10.1002/pssa.200778330
Funders: Funded by Deutsche Forschungsgemeinschaft (DFG). Grant Number: EN207/19-1
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