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Damascene Metal Gate Technology: A Novel Approach towards Nano CMOS Devices with Crystalline High-K Gate Dielectrics

Endres, Ralf and Schwalke, Udo (2007):
Damascene Metal Gate Technology: A Novel Approach towards Nano CMOS Devices with Crystalline High-K Gate Dielectrics.
In: Nanotech Northern Europe (NTNE), Helsinki, Finnland, 27.-29.03.2007, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 2007
Creators: Endres, Ralf and Schwalke, Udo
Title: Damascene Metal Gate Technology: A Novel Approach towards Nano CMOS Devices with Crystalline High-K Gate Dielectrics
Language: English
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: Nanotech Northern Europe (NTNE)
Event Location: Helsinki, Finnland
Event Dates: 27.-29.03.2007
Date Deposited: 20 Nov 2008 08:28
License: [undefiniert]
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