TU Darmstadt / ULB / TUbiblio

Chemical bonding in carbonitride nanolayers

Hoffmann, P. ; Baake, O. ; Beckhoff, B. ; Ensinger, W. ; Fainer, N. ; Klein, Andreas ; Kosinova, M. ; Pollakowski, B. ; Trunova, V. ; Ulm, G. ; Weser, J. (2007)
Chemical bonding in carbonitride nanolayers.
In: Nuclear Instruments and Methods in Physics Research Section A, 575 (1-2)
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

First results are presented for the identification of chemical bonds and structures (speciation) in boron and silicon carbonitrides, produced as layers of some hundred nm. The boron carbonitride (BCxNy) films are synthesized by low-pressure chemical vapor deposition (LPCVD) using the precursor substance trimethylamine borane. The samples of silicon carbonitride (SiCxNy) films are synthesized by plasma-enhanced chemical vapor deposition (PECVD) using hexamethyl disilazane. The measurements were performed by total reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine structure investigations (TXRF-NEXAFS) and by X-ray photo-electron spectroscopy (XPS). The results are compared with those obtained for standard samples boron carbide (B4C), boron nitride (e.g., h-BN, c-BN), silicon carbide (SiC), and silicon nitride (Si3N4).

Typ des Eintrags: Artikel
Erschienen: 2007
Autor(en): Hoffmann, P. ; Baake, O. ; Beckhoff, B. ; Ensinger, W. ; Fainer, N. ; Klein, Andreas ; Kosinova, M. ; Pollakowski, B. ; Trunova, V. ; Ulm, G. ; Weser, J.
Art des Eintrags: Bibliographie
Titel: Chemical bonding in carbonitride nanolayers
Sprache: Englisch
Publikationsjahr: 21 Mai 2007
Verlag: Elsevier
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Nuclear Instruments and Methods in Physics Research Section A
Jahrgang/Volume einer Zeitschrift: 575
(Heft-)Nummer: 1-2
Kurzbeschreibung (Abstract):

First results are presented for the identification of chemical bonds and structures (speciation) in boron and silicon carbonitrides, produced as layers of some hundred nm. The boron carbonitride (BCxNy) films are synthesized by low-pressure chemical vapor deposition (LPCVD) using the precursor substance trimethylamine borane. The samples of silicon carbonitride (SiCxNy) films are synthesized by plasma-enhanced chemical vapor deposition (PECVD) using hexamethyl disilazane. The measurements were performed by total reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine structure investigations (TXRF-NEXAFS) and by X-ray photo-electron spectroscopy (XPS). The results are compared with those obtained for standard samples boron carbide (B4C), boron nitride (e.g., h-BN, c-BN), silicon carbide (SiC), and silicon nitride (Si3N4).

Freie Schlagworte: Chemical bonding; Boron carbonitrides; Silicon carbonitrides; X-ray fluorescence analysis
Zusätzliche Informationen:

Proceedings of the XVI International Synchrotron Radiation Conference — SR 2006

Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung
Hinterlegungsdatum: 20 Nov 2008 08:28
Letzte Änderung: 20 Feb 2020 13:23
PPN:
Sponsoren: The authors acknowledge the financial support granted by the German Research Foundation (DFG) for the joint research project “Nanolayer Speciation”., N.F., M.K., and V.T. thank RFBR for the Grant 06-03 32713 and Minobrnauka for the support of the leading scientific schools, by the Contract No. 02.445.11.7387., The authors are indebted to T. Holz, AXO Dresden, and P.U. Pennartz, Osmic, for placing a BN nanolayer and a B4C/SiC multiplayer, resp., to our disposal.
Export:
Suche nach Titel in: TUfind oder in Google
Frage zum Eintrag Frage zum Eintrag

Optionen (nur für Redakteure)
Redaktionelle Details anzeigen Redaktionelle Details anzeigen