Stefanov, Yordan and Schwalke, Udo Li, Yuzhuo (ed.) (2007):
Shallow Trench Isolation Chemical Mechanical Planarization.
In: Microelectronic Applications of Chemical Mechanical Planarization, Hoboken, NJ, USA, Wiley, ISBN 978-0-471-71919-9,
[Book Section]
| Item Type: | Book Section |
|---|---|
| Erschienen: | 2007 |
| Editors: | Li, Yuzhuo |
| Creators: | Stefanov, Yordan and Schwalke, Udo |
| Title: | Shallow Trench Isolation Chemical Mechanical Planarization |
| Language: | English |
| Title of Book: | Microelectronic Applications of Chemical Mechanical Planarization |
| Place of Publication: | Hoboken, NJ, USA |
| Publisher: | Wiley |
| ISBN: | 978-0-471-71919-9 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 20 Nov 2008 08:25 |
| License: | [undefiniert] |
| Export: | |
| Suche nach Titel in: | TUfind oder in Google |
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