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Conductive Atomic Force Microscopy Study of Leakage Currents Through Microscopic Structural Defects in High-K Gate Dielectrics

Stefanov, Yordan and Singh, Ravneet and DasGupta, Nandita and Misra, Pankaj and Schwalke, Udo (2005):
Conductive Atomic Force Microscopy Study of Leakage Currents Through Microscopic Structural Defects in High-K Gate Dielectrics.
In: Proceedings of The Electrochemical Society Conference "Crystalline Defects and Contamination" (ECS-DECON), [Article]

Item Type: Article
Erschienen: 2005
Creators: Stefanov, Yordan and Singh, Ravneet and DasGupta, Nandita and Misra, Pankaj and Schwalke, Udo
Title: Conductive Atomic Force Microscopy Study of Leakage Currents Through Microscopic Structural Defects in High-K Gate Dielectrics
Language: English
Journal or Publication Title: Proceedings of The Electrochemical Society Conference "Crystalline Defects and Contamination" (ECS-DECON)
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: The Electrochemical Society Conference "Crystalline Defects and Contamination" (ECS-DECON)
Event Location: Grenoble, Frankreich
Date Deposited: 20 Nov 2008 08:22
License: [undefiniert]
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