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Ion permeability of amorphous hydrogen- and fluorine-containing carbon films formed by plasma enhanced chemical vapour deposition

Sittner, Falk ; Ensinger, Wolfgang :
Ion permeability of amorphous hydrogen- and fluorine-containing carbon films formed by plasma enhanced chemical vapour deposition.
In: Nuclear Instruments and Methods in Physxics Research Section B, 257 (1-2) pp. 737-740.
[Artikel], (2007)

Kurzbeschreibung (Abstract)

Methane, tetra-fluoro-methane and mixtures of both gases were ionized by radiofrequency excitation at 13.56 MHz under reduced pressure. The ionic species from the plasma such as View the MathML source or View the MathML source were accelerated in an electrical field and deposited onto iron substrates, forming films of amorphous carbon with hydrogen and fluorine. Their sealing performance as protective coating on the iron substrates against aqueous corrosion was tested by electrochemical methods. Therefore, the ion permeability of the coating material was measured by means of the dissolution current of the substrate material. The influence of film thickness and plasma gas composition was evaluated.

Typ des Eintrags: Artikel
Erschienen: 2007
Autor(en): Sittner, Falk ; Ensinger, Wolfgang
Titel: Ion permeability of amorphous hydrogen- and fluorine-containing carbon films formed by plasma enhanced chemical vapour deposition
Sprache: Englisch
Kurzbeschreibung (Abstract):

Methane, tetra-fluoro-methane and mixtures of both gases were ionized by radiofrequency excitation at 13.56 MHz under reduced pressure. The ionic species from the plasma such as View the MathML source or View the MathML source were accelerated in an electrical field and deposited onto iron substrates, forming films of amorphous carbon with hydrogen and fluorine. Their sealing performance as protective coating on the iron substrates against aqueous corrosion was tested by electrochemical methods. Therefore, the ion permeability of the coating material was measured by means of the dissolution current of the substrate material. The influence of film thickness and plasma gas composition was evaluated.

Titel der Zeitschrift, Zeitung oder Schriftenreihe: Nuclear Instruments and Methods in Physxics Research Section B
Band: 257
(Heft-)Nummer: 1-2
Verlag: Elsevier
Freie Schlagworte: Thin films; Porosity; Electrochemistry; Corrosion
Fachbereich(e)/-gebiet(e): Fachbereich Material- und Geowissenschaften > Materialwissenschaften > Materialanalytik
Fachbereich Material- und Geowissenschaften > Materialwissenschaften
Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 20 Nov 2008 08:21
Zusätzliche Informationen:

Ion Beam Modification of Materials — Proceedings of the 15th International Conference on Ion Beam Modification of Materials

15th International Conference on Ion Beam Modification of Materials

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