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Effect of total gas and oxygen partial pressure during deposition on the properties of sputtered V2O5 thin films

Gies, Astrid and Pecquenard, B. and Benayad, A. and Martinez, H. and Gonbeau, D. and Fuess, Hartmut and Levasseur, A. (2005):
Effect of total gas and oxygen partial pressure during deposition on the properties of sputtered V2O5 thin films.
In: Solid State Ionics, 176. pp. 1627-1634, [Article]

Item Type: Article
Erschienen: 2005
Creators: Gies, Astrid and Pecquenard, B. and Benayad, A. and Martinez, H. and Gonbeau, D. and Fuess, Hartmut and Levasseur, A.
Title: Effect of total gas and oxygen partial pressure during deposition on the properties of sputtered V2O5 thin films
Language: English
Journal or Publication Title: Solid State Ionics
Journal volume: 176
Divisions: 11 Department of Materials and Earth Sciences
Date Deposited: 20 Nov 2008 08:21
License: [undefiniert]
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