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Process Integration and Electrical Characterization of Crystalline High-K Gate Dielectrics

Schwalke, Udo and Stefanov, Yordan (2004):
Process Integration and Electrical Characterization of Crystalline High-K Gate Dielectrics.
Elsevier, In: 13th Workshop on Dielectrics in Microelectronics (WoDIM), Kinsale, Irland, 28.-30.06.2004, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 2004
Creators: Schwalke, Udo and Stefanov, Yordan
Title: Process Integration and Electrical Characterization of Crystalline High-K Gate Dielectrics
Language: English
Publisher: Elsevier
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: 13th Workshop on Dielectrics in Microelectronics (WoDIM)
Event Location: Kinsale, Irland
Event Dates: 28.-30.06.2004
Date Deposited: 20 Nov 2008 08:20
License: [undefiniert]
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