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RFA as control of the reactive sputtering process on TiN films

Stobiecki, T. and Stobiecki, and Conradi, and Kraegermann, and Röll, and Berg, :
RFA as control of the reactive sputtering process on TiN films.
In: Fresenius journal of analytical chemistry. 353 (1995), S. 536-540
[Article] , (1995)

Item Type: Article
Erschienen: 1995
Creators: Stobiecki, T. and Stobiecki, and Conradi, and Kraegermann, and Röll, and Berg,
Title: RFA as control of the reactive sputtering process on TiN films
Language: English
Journal or Publication Title: Fresenius journal of analytical chemistry. 353 (1995), S. 536-540
Divisions: 16 Department of Mechanical Engineering
Date Deposited: 19 Nov 2008 15:56
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