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Correlation of acetylene plasma discharge environment and the optical and electronic properties of the hydrogenated amorphous carbon films

Aldeeb, Mustafa A. ; Morgan, Nasser ; Abouelsayed, A. ; Amin, Khaled M. ; Hassaballa, Safwat (2019)
Correlation of acetylene plasma discharge environment and the optical and electronic properties of the hydrogenated amorphous carbon films.
In: Diamond and Related Materials, 96
doi: 10.1016/J.DIAMOND.2019.04.021
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Thin films from polymeric and graphitic hydrogenated amorphous carbon (a-C:H) were deposited over a glass substrate from acetylene (C2H2) plasma by using a conventional plasma enhanced chemical vapor deposition (PECVD). Radio frequency capacitively coupled plasma (RF CCP) source operating at a frequency of 13.56 MHz was used for generation of the discharge. Optical emission spectroscopy (OES) results showed strong optical emissions from diacetylene ion C4H2+ at a wavelength of 506 nm. The energy dispersive X-ray (EDS) measurements illustrated that the carbon content in the deposited films increased with increasing of power. The Raman and IR results demonstrated that the films deposited at low bias voltages 340 V are so called polymeric a-C:H with high sp3 fraction and high hydrogen content, while the films deposited at high bias voltages 877 V are so called graphitic a-C:H with low sp3 fraction and low hydrogen content. Quantitative information were obtained from fitting the high asymmetrical vibrational modes of Raman and IR spectra by using Fano model expression together with Lorentzian function. The results presented here point out that there is a relation between the intensity of C4H2+ ion emissions and the deposited films properties.

Typ des Eintrags: Artikel
Erschienen: 2019
Autor(en): Aldeeb, Mustafa A. ; Morgan, Nasser ; Abouelsayed, A. ; Amin, Khaled M. ; Hassaballa, Safwat
Art des Eintrags: Bibliographie
Titel: Correlation of acetylene plasma discharge environment and the optical and electronic properties of the hydrogenated amorphous carbon films
Sprache: Englisch
Publikationsjahr: Juni 2019
Verlag: Elsevier
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Diamond and Related Materials
Jahrgang/Volume einer Zeitschrift: 96
DOI: 10.1016/J.DIAMOND.2019.04.021
URL / URN: https://www.sciencedirect.com/science/article/pii/S092596351...
Kurzbeschreibung (Abstract):

Thin films from polymeric and graphitic hydrogenated amorphous carbon (a-C:H) were deposited over a glass substrate from acetylene (C2H2) plasma by using a conventional plasma enhanced chemical vapor deposition (PECVD). Radio frequency capacitively coupled plasma (RF CCP) source operating at a frequency of 13.56 MHz was used for generation of the discharge. Optical emission spectroscopy (OES) results showed strong optical emissions from diacetylene ion C4H2+ at a wavelength of 506 nm. The energy dispersive X-ray (EDS) measurements illustrated that the carbon content in the deposited films increased with increasing of power. The Raman and IR results demonstrated that the films deposited at low bias voltages 340 V are so called polymeric a-C:H with high sp3 fraction and high hydrogen content, while the films deposited at high bias voltages 877 V are so called graphitic a-C:H with low sp3 fraction and low hydrogen content. Quantitative information were obtained from fitting the high asymmetrical vibrational modes of Raman and IR spectra by using Fano model expression together with Lorentzian function. The results presented here point out that there is a relation between the intensity of C4H2+ ion emissions and the deposited films properties.

Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
Hinterlegungsdatum: 29 Okt 2020 06:29
Letzte Änderung: 29 Okt 2020 06:29
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